ANNOx CLD 844 CM h






CLD 844 CM h

CLD 844 CM h specifications

CLD 844 CM h flow diagram



The CLD 844 CM h is capable to measure and display NO, NO2, NOX, NH3 and the total NOX-amines! The heated inlet
minimizes chemical alterations of the sample gas.

Two instead of one. The CLD 844 CM h analyser is optimised for the measurement of N-containing compounds such as NO, NO2, NH3, NMP and amines. The outstanding feature is the concept of two parallel reaction chambers. They guarantee simultaneous measurement of e.g. NO and NOX in order to generate the precise value of NO2. Thanks to its two converter with different characteristics measuring NOX and the total of NOX-amines allows even to determine the NH3. The required measurement mode can be selected via the keypad at the front panel.

Display of NOX-amines, and NH3

A fascinating technology. The analyser is not only a state-of-the art product in terms of precision and reliability. Its technological base also sets the trend for others. All components are contained in a case of only 3 HU, including vacuum pump and thermal ozone scrubber. Naturally occurring pressure variations in the sample flow are balanced
out by means of an electronic and mechanical bypass system (r). This module is not required in systems with an external sample pressure regulation. Due to the heated inlet (h) no external preconditioning is required. This minimises chemical alterations of the sample gas, e.g. salt formation with amines reduce the measured value of NH3.

User friendliness is a top priority. The analyser can be operated by means of the integrated keypad or remotely from a personal computer. The clear layout of the menu structure
guides the user and enables him to take advantage of all analyser functions with simple commands.


  • Freely selectable
    measurement ranges
  • Choice between
    several measurement modes
  • Error message
    coded and in
    full text
  • Rapid system
  • Virtually maintenance free even in continuous operation.

  • Monitoring of process chemicals
    and gases
  • Permanent monitoring of clean
    room conditions
  • Process control such as
    photolithography, etching, etc.
  • R&D of DeNOx devices